Class Schedule

MT240 RF Plasma Systems

Covers the theory and practice of RF (Radio Frequency) plasma systems as used in semiconductor manufacturing processes such as etching, chemical vapor deposition (CVD) and sputter deposition. Includes plasma physics, RF power system components, power matching and match circuits, and applications in semiconductor manufacturing. Prerequisite: MT 112A or MT 112, MT 223, CH 100 or higher, WR 227, or instructor permission. Audit available. (See course content and outcomes.)

Credits: 3

List of classes for MT240 RF Plasma Systems
CRNClass typeLocationDays & timeDatesSeats availableFacultyMore info
10132In-person labRock Creek BLDG7 231
Monday
from 11am to 1:50pm
From January 4 through March 20, 2027
Eric J KirchnerBooks for CRN 10132
Class details for CRN 10132
Fees: $12
and In-person lectureRock Creek BLDG7 231
Tuesday
from 12 to 1:50pm
From January 4 through March 20, 2027

Class schedule definitions

Cost:
cost is based on the number of credits – see tuition and fees
Books:
$0 or <$40 means low cost books (doesn't include other supplies like calculators)
Register:
use the CRN to register in MyPCC – see how to register
Class types:
see more about class types
  • In-Person: Instructional time will happen in-person. Class meetings take place at specific times and locations.
  • Online (no scheduled meetings): Instruction will take place through regular online activities and assignments with scheduled due dates. Classes do not have meeting times.
  • Online (scheduled meetings): Instructional time will happen online. Class meetings will take place at scheduled days/times online.
  • In-person & Online (scheduled meetings): Class meetings take place at a specific time & day, with some meetings in-person and some online, usually in Zoom.
  • In-person & Online (no scheduled meetings): Class meetings are in-person and have additional online activities.
  • Online (scheduled meetings) & Online (no scheduled meetings): classes meet remotely with additional online activities required.